ICCAS OpenIR
The role of sulfite in the wetting etching of silicon and silica
Ouyang, JH; Wu, NZ; Zhao, XS
2004-06-01
Source PublicationACTA PHYSICO-CHIMICA SINICA
ISSN1000-6818
Volume20Issue:6Pages:612-615
AbstractThe effects of sulfite on the etching processes of silicon and silica in 40% ( w) NH4F aqueous solution have been studied by a method based on photolithography and atomic force microscopy (AFM). It is demonstrated that the silicon and silica etching rates depend on the sulfite concentrations. The spectra of the F 1 s core level in the high resolution X-ray photoelectron spectroscopy (XPS) for surfaces treated in solutions with/without sulfite suggest the chemistry of the surfaces is different in the two cases. The experimental results indicate that sulfite not only acts as an oxygen scavenger, but also influences the surface reactions in the wetting etching of Si and SiO2.
KeywordSilicon Silica Etching Rate Ammonium Fluoride Ammonium Sulfite Photolithography
DOI10.3866/PKU.WHXB20040612
Indexed BySCI
Language英语
WOS IDWOS:000222223400012
PublisherPEKING UNIV PRESS
Citation statistics
Cited Times:1[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.iccas.ac.cn/handle/121111/82066
Collection中国科学院化学研究所
Corresponding AuthorZhao, XS
Affiliation1.Peking Univ, Coll Chem & Mol Engn, State Key Lab Struct Chem Unstable & Stable Speci, Beijing 100871, Peoples R China
2.Peking Univ, Coll Chem & Mol Engn, Dept Biol Chem, Beijing 100871, Peoples R China
Recommended Citation
GB/T 7714
Ouyang, JH,Wu, NZ,Zhao, XS. The role of sulfite in the wetting etching of silicon and silica[J]. ACTA PHYSICO-CHIMICA SINICA,2004,20(6):612-615.
APA Ouyang, JH,Wu, NZ,&Zhao, XS.(2004).The role of sulfite in the wetting etching of silicon and silica.ACTA PHYSICO-CHIMICA SINICA,20(6),612-615.
MLA Ouyang, JH,et al."The role of sulfite in the wetting etching of silicon and silica".ACTA PHYSICO-CHIMICA SINICA 20.6(2004):612-615.
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