ICCAS OpenIR
Lateral nanopatterns in thin diblock copolymer films induced by selective solvents
Chen, Y; Huang, HY; Hu, ZJ; He, TB
2004-04-27
Source PublicationLANGMUIR
ISSN0743-7463
Volume20Issue:9Pages:3805-3808
DOI10.1021/la0360815
Indexed BySCI
Language英语
WOS IDWOS:000221022400052
PublisherAMER CHEMICAL SOC
Citation statistics
Cited Times:42[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.iccas.ac.cn/handle/121111/82010
Collection中国科学院化学研究所
Corresponding AuthorHe, TB
AffiliationChinese Acad Sci, Changchun Inst Appl Chem, State Key Lab Polymer Phys & Chem, Changchun 130022, Peoples R China
Recommended Citation
GB/T 7714
Chen, Y,Huang, HY,Hu, ZJ,et al. Lateral nanopatterns in thin diblock copolymer films induced by selective solvents[J]. LANGMUIR,2004,20(9):3805-3808.
APA Chen, Y,Huang, HY,Hu, ZJ,&He, TB.(2004).Lateral nanopatterns in thin diblock copolymer films induced by selective solvents.LANGMUIR,20(9),3805-3808.
MLA Chen, Y,et al."Lateral nanopatterns in thin diblock copolymer films induced by selective solvents".LANGMUIR 20.9(2004):3805-3808.
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