ICCAS OpenIR
How to form regular polymer microstructures by surface-pattern-directed dewetting
Zhang, ZX; Wang, Z; Xing, RB; Han, YC
2003-08-01
Source PublicationSURFACE SCIENCE
ISSN0039-6028
Volume539Issue:1-3Pages:129-136
AbstractThe substrates with regular patterns of self-assembly monolayers (SAMs) produced by microcontact printing with octadecyltrichlorosilane (OTS) was employed to direct thin polystyrene dewetting to fabricate ordered micrometer scale pattern. The pattern sizes and pattern fashion can be manipulated by controlling the experimental parameters. The pattern formation mechanisms have been discussed. The dewetting pattern can be transferred to form PDMS stamp for future microfabrication process. (C) 2003 Elsevier B.V. All rights reserved.
KeywordAtomic Force Microscopy Self-assembly Wetting
DOI10.1016/S0039-6028(03)00785-4
Indexed BySCI
Language英语
WOS IDWOS:000184585300025
PublisherELSEVIER SCIENCE BV
Citation statistics
Cited Times:47[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.iccas.ac.cn/handle/121111/81076
Collection中国科学院化学研究所
Corresponding AuthorHan, YC
AffiliationChinese Acad Sci, Changchun Inst Appl Chem, State Key Lab Polymer Phys & Chem, Changchun 130022, Peoples R China
Recommended Citation
GB/T 7714
Zhang, ZX,Wang, Z,Xing, RB,et al. How to form regular polymer microstructures by surface-pattern-directed dewetting[J]. SURFACE SCIENCE,2003,539(1-3):129-136.
APA Zhang, ZX,Wang, Z,Xing, RB,&Han, YC.(2003).How to form regular polymer microstructures by surface-pattern-directed dewetting.SURFACE SCIENCE,539(1-3),129-136.
MLA Zhang, ZX,et al."How to form regular polymer microstructures by surface-pattern-directed dewetting".SURFACE SCIENCE 539.1-3(2003):129-136.
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