Pattern formation in polymer films under the mask
Peng, J; Han, YC; Yang, YM; Li, BY
Source PublicationPOLYMER
AbstractThis paper presents a straightforward method for patterning thin films of polymers, i.e. a prepatterned mask is used to induce self-assembly of polymers and the resulting pattern is the same as the lateral structures in the mask on a submicrometre length scale, The patterns can be formed at above T-g + 30 degreesC in a short time and the external electric field is not crucial. Electrostatic force is assumed to be the driving force for the pattern transfer. Viscous fingering and novel stress-relief lateral morphology induced under the featureless mask are also observed and the formation mechanisms are discussed. (C) 2003 Elsevier Science Ltd. All rights reserved.
KeywordPatterning Polymer Film Electrostatic Instability
Indexed BySCI
WOS IDWOS:000181914600024
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Cited Times:16[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Corresponding AuthorHan, YC
AffiliationChinese Acad Sci, Changchun Inst Appl Chem, State Key Lab Polymer Phys & Chem, Changchun 130022, Peoples R China
Recommended Citation
GB/T 7714
Peng, J,Han, YC,Yang, YM,et al. Pattern formation in polymer films under the mask[J]. POLYMER,2003,44(8):2379-2384.
APA Peng, J,Han, YC,Yang, YM,&Li, BY.(2003).Pattern formation in polymer films under the mask.POLYMER,44(8),2379-2384.
MLA Peng, J,et al."Pattern formation in polymer films under the mask".POLYMER 44.8(2003):2379-2384.
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