ICCAS OpenIR
Influence of the substrate temperature during deposition on film characteristics of copper phthalocyanine and field-effect transistor properties
Xiao, K; Liu, Y; Yu, G; Zhu, D
2003-08-01
Source PublicationAPPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
ISSN0947-8396
Volume77Issue:3-4Pages:367-370
AbstractIn this paper, we employ different substrate temperatures during the deposition process and observe a highly ordered structure and strong orientation of copper phthalocyanine (CuPc) molecules on Si/SiO2 by using X-ray-diffraction and transmission electron microscopy analysis. The results show the effect of CuPc morphology at different substrate temperatures on the organic field-effect-transistor performance. When the substrate temperature for deposition of CuPc is 120 degreesC, a mobility of 3.75x10(-3) cm(2)/V s can be obtained.
DOI10.1007/s00339-003-2169-6
Indexed BySCI
Language英语
WOS IDWOS:000184296000004
PublisherSPRINGER-VERLAG
Citation statistics
Document Type期刊论文
Identifierhttp://ir.iccas.ac.cn/handle/121111/80566
Collection中国科学院化学研究所
Corresponding AuthorLiu, Y
AffiliationChinese Acad Sci, Inst Chem, Ctr Mol Sci, Beijing 100080, Peoples R China
Recommended Citation
GB/T 7714
Xiao, K,Liu, Y,Yu, G,et al. Influence of the substrate temperature during deposition on film characteristics of copper phthalocyanine and field-effect transistor properties[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING,2003,77(3-4):367-370.
APA Xiao, K,Liu, Y,Yu, G,&Zhu, D.(2003).Influence of the substrate temperature during deposition on film characteristics of copper phthalocyanine and field-effect transistor properties.APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING,77(3-4),367-370.
MLA Xiao, K,et al."Influence of the substrate temperature during deposition on film characteristics of copper phthalocyanine and field-effect transistor properties".APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING 77.3-4(2003):367-370.
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