ICCAS OpenIR
Electrochemical fabrication of one-dimensional silica nanostructures
Xu, DS; Yu, YX; Zheng, M; Guo, GL; Tang, YQ
2003-08-01
Source PublicationELECTROCHEMISTRY COMMUNICATIONS
ISSN1388-2481
Volume5Issue:8Pages:673-676
AbstractElectrochemically induced sot-gel deposition has been used to generate one-dimensional silica nanostructures, such as nanotube, "bamboo-like" structure and nanowire. The deposition was carried out in the pores of the anodic alumina membrane from a mixed tetraethoxysilane (TEOS), ethanol and 0.3 M KNO3 aqueous solution in a potential range between -0.95 and -1.25 V. We demonstrated that the growth of these nanostructures is strongly dominated by the electrochemical process. (C) 2003 Published by Elsevier B.V.
KeywordNanowires Nanotubes Silica Electrodeposit Sol-gel Template
DOI10.1016/S1388-2481(03)00149-8
Indexed BySCI
Language英语
WOS IDWOS:000184670200010
PublisherELSEVIER SCIENCE INC
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Document Type期刊论文
Identifierhttp://ir.iccas.ac.cn/handle/121111/80130
Collection中国科学院化学研究所
Corresponding AuthorXu, DS
AffiliationPeking Univ, Coll Chem & Mol Engn, State Key Lab Struct Chem Unstable & Stable Speci, Beijing 100871, Peoples R China
Recommended Citation
GB/T 7714
Xu, DS,Yu, YX,Zheng, M,et al. Electrochemical fabrication of one-dimensional silica nanostructures[J]. ELECTROCHEMISTRY COMMUNICATIONS,2003,5(8):673-676.
APA Xu, DS,Yu, YX,Zheng, M,Guo, GL,&Tang, YQ.(2003).Electrochemical fabrication of one-dimensional silica nanostructures.ELECTROCHEMISTRY COMMUNICATIONS,5(8),673-676.
MLA Xu, DS,et al."Electrochemical fabrication of one-dimensional silica nanostructures".ELECTROCHEMISTRY COMMUNICATIONS 5.8(2003):673-676.
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