ICCAS OpenIR
Aerosol-assisted formation of mesostructured thin films
Lu, YF; McCaughey, BF; Wang, DH; Hampsey, JE; Doke, N; Yang, ZZ; Brinker, CJ
2003-10-16
Source PublicationADVANCED MATERIALS
ISSN0935-9648
Volume15Issue:20Pages:1733-+
AbstractA new aerosol-assisted surfactant self-assembly approach has been developed for large-scale mesostructured silica thin film fabrication. The formation mechanism involves coalescence of semisolid surfactant-silica mesostructured particles on substrates (see Figure) and subsequent reassembly of the mesostructures to adapt the morphology transformation from spherical to planar shape.
DOI10.1002/adma.200305331
Indexed BySCI
Language英语
WOS IDWOS:000186425600011
PublisherWILEY-V C H VERLAG GMBH
Citation statistics
Document Type期刊论文
Identifierhttp://ir.iccas.ac.cn/handle/121111/80114
Collection中国科学院化学研究所
Corresponding AuthorBrinker, CJ
Affiliation1.Tulane Univ, Dept Chem Engn, New Orleans, LA 70118 USA
2.Univ New Mexico, Dept Chem & Nucl Engn, Albuquerque, NM 87131 USA
3.Univ New Mexico, Sandia Natl Labs, Albuquerque, NM 87131 USA
4.Chinese Acad Sci, State Key Lab Polymer Phys & Chem, Ctr Mol Sci, Inst Chem, Beijing 100080, Peoples R China
Recommended Citation
GB/T 7714
Lu, YF,McCaughey, BF,Wang, DH,et al. Aerosol-assisted formation of mesostructured thin films[J]. ADVANCED MATERIALS,2003,15(20):1733-+.
APA Lu, YF.,McCaughey, BF.,Wang, DH.,Hampsey, JE.,Doke, N.,...&Brinker, CJ.(2003).Aerosol-assisted formation of mesostructured thin films.ADVANCED MATERIALS,15(20),1733-+.
MLA Lu, YF,et al."Aerosol-assisted formation of mesostructured thin films".ADVANCED MATERIALS 15.20(2003):1733-+.
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