ICCAS OpenIR
Studies of photosensitive alignment layer based on ladder-like polysilsequioxane liquid-crystal devices using atomic force microscopy/force curve
Zhu, CF; Shang, GY; Li, BS; Wang, C; Cui, L; Xie, P; Zhang, RB
2003-05-01
Source PublicationSURFACE AND INTERFACE ANALYSIS
ISSN0142-2421
Volume35Issue:5Pages:459-462
AbstractAtomic force microscopy (AFM)/force curve measurements were used to study the photochemical process of UV-treated (0, 10, 20, 30 and 60 min) organic thin films that were prepared from azobenzene and cinnamate side-chain co-grafted ladder-like polysilsequioxanes (LPS). The morphological data of the thin films describe the changing process on the surface of the thin film. The statistical results of the adhesion force of the thin films further demonstrate the intermolecular characteristics of the thin films. A photosensitive thin film after UV exposure for 20 min would be a better material with a preferred orientation that can be used to make liquid-crystal devices. Copyright (C) 2003 John Wiley Sons, Ltd.
KeywordPhotosensitive Thin Film Adhesion Force
DOI10.1002/sia.1555
Indexed BySCI
Language英语
WOS IDWOS:000182909700008
PublisherJOHN WILEY & SONS LTD
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Document Type期刊论文
Identifierhttp://ir.iccas.ac.cn/handle/121111/79726
Collection中国科学院化学研究所
Corresponding AuthorWang, C
AffiliationChinese Acad Sci, Inst Chem, Ctr Mol Sci, Beijing 100080, Peoples R China
Recommended Citation
GB/T 7714
Zhu, CF,Shang, GY,Li, BS,et al. Studies of photosensitive alignment layer based on ladder-like polysilsequioxane liquid-crystal devices using atomic force microscopy/force curve[J]. SURFACE AND INTERFACE ANALYSIS,2003,35(5):459-462.
APA Zhu, CF.,Shang, GY.,Li, BS.,Wang, C.,Cui, L.,...&Zhang, RB.(2003).Studies of photosensitive alignment layer based on ladder-like polysilsequioxane liquid-crystal devices using atomic force microscopy/force curve.SURFACE AND INTERFACE ANALYSIS,35(5),459-462.
MLA Zhu, CF,et al."Studies of photosensitive alignment layer based on ladder-like polysilsequioxane liquid-crystal devices using atomic force microscopy/force curve".SURFACE AND INTERFACE ANALYSIS 35.5(2003):459-462.
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