ICCAS OpenIR
Photo-induced DNA cleavage in self-assembly multilayer films
Zhang, YJ; Yang, SG; Liu, XH; Cao, WX; Xu, J; Li, YL
2002
Source PublicationNEW JOURNAL OF CHEMISTRY
ISSN1144-0546
Volume26Issue:5Pages:617-620
AbstractElectrostatic self-assembly multilayer films have been successfully fabricated from a C-60-ethylenediamine adduct (C-60-EDA), and DNA. Under visible light irradiation, the DNA is cleaved and the films are destroyed. The photo-induced reaction follows a direct electron-transfer mechanism. A high oxygen concentration in the solution enhances the reaction, while separation of C-60-EDA and DNA retards the reaction dramatically.
DOI10.1039/b111722j
Indexed BySCI
Language英语
WOS IDWOS:000175757200022
PublisherROYAL SOC CHEMISTRY
Citation statistics
Cited Times:15[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.iccas.ac.cn/handle/121111/78530
Collection中国科学院化学研究所
Corresponding AuthorZhang, YJ
Affiliation1.Chinese Acad Sci, Inst Chem, State Key Lab Polymer Phys & Chem, Ctr Mol Sci, Beijing 100080, Peoples R China
2.Chinese Acad Sci, Technol Inst Phys & Chem, Beijing 100101, Peoples R China
3.Peking Univ, Coll Chem & Mol Engn, Beijing 100871, Peoples R China
Recommended Citation
GB/T 7714
Zhang, YJ,Yang, SG,Liu, XH,et al. Photo-induced DNA cleavage in self-assembly multilayer films[J]. NEW JOURNAL OF CHEMISTRY,2002,26(5):617-620.
APA Zhang, YJ,Yang, SG,Liu, XH,Cao, WX,Xu, J,&Li, YL.(2002).Photo-induced DNA cleavage in self-assembly multilayer films.NEW JOURNAL OF CHEMISTRY,26(5),617-620.
MLA Zhang, YJ,et al."Photo-induced DNA cleavage in self-assembly multilayer films".NEW JOURNAL OF CHEMISTRY 26.5(2002):617-620.
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