ICCAS OpenIR
Electron-induced gasification reactions in the fabrication process on graphite surface using scanning tunneling microscopy
Wu, J; Wang, C; Qiu, XH; Shang, GY; Wang, NX; Bai, CL
1999-08-15
Source PublicationJOURNAL OF APPLIED PHYSICS
ISSN0021-8979
Volume86Issue:4Pages:2342-2345
AbstractWe have studied the dependence of nanofabrication on the pulse duration explicitly with scanning tunneling microscopy, using graphite as an example. It is demonstrated that, under comparable conditions, the depth of the as-generated craters has monotonic correlation with the pulse duration, while the apparent surface diameters do not show significant changes. This is believed to be direct evidence that the electron-induced gasification reaction of the carbon atoms did occur during fabrication, rather than field evaporation mechanism. The removal rate of the carbon atoms is estimated to be on the order of 10(5)/s. In addition, the characteristics of the fabrication is shown to be related to the specific reaction type. (C) 1999 American Institute of Physics. [S0021-8979(99)02916-3].
Indexed BySCI
Language英语
WOS IDWOS:000081720600088
PublisherAMER INST PHYSICS
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Document Type期刊论文
Identifierhttp://ir.iccas.ac.cn/handle/121111/75550
Collection中国科学院化学研究所
Corresponding AuthorWu, J
AffiliationChinese Acad Sci, Inst Chem, Beijing 100080, Peoples R China
Recommended Citation
GB/T 7714
Wu, J,Wang, C,Qiu, XH,et al. Electron-induced gasification reactions in the fabrication process on graphite surface using scanning tunneling microscopy[J]. JOURNAL OF APPLIED PHYSICS,1999,86(4):2342-2345.
APA Wu, J,Wang, C,Qiu, XH,Shang, GY,Wang, NX,&Bai, CL.(1999).Electron-induced gasification reactions in the fabrication process on graphite surface using scanning tunneling microscopy.JOURNAL OF APPLIED PHYSICS,86(4),2342-2345.
MLA Wu, J,et al."Electron-induced gasification reactions in the fabrication process on graphite surface using scanning tunneling microscopy".JOURNAL OF APPLIED PHYSICS 86.4(1999):2342-2345.
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