ICCAS OpenIR
Wavelength sensitivity of photo-oxidation of polyamide 6
Hu, XZ
1998
Source PublicationPOLYMER DEGRADATION AND STABILITY
ISSN0141-3910
Volume62Issue:3Pages:599-601
AbstractThe wavelength sensitivity of polyamide 6 films exposed to filtered xenon are radiation was studied by the sharp cut filter technique based on the changes in UV absorption. The spectral sensitivity curves and activation spectra were obtained. It was found that the photo-oxidation of PA6 can be caused by light in a wide wavelength range of about 260-480 nm. From the activation spectra it was shown that there exist two distinctly separate spectral regions responsible for causing PA photo-oxidation: wavelengths below 300 nm and in the range of 340-400 nm. The results are discussed from the point of view of the initiation mechanism of PA photo-oxidation. (C) 1998 Elsevier Science Limited. All rights reserved.
Indexed BySCI
Language英语
WOS IDWOS:000077477200024
PublisherELSEVIER SCI LTD
Citation statistics
Cited Times:9[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.iccas.ac.cn/handle/121111/74652
Collection中国科学院化学研究所
Corresponding AuthorHu, XZ
AffiliationChinese Acad Sci, Inst Chem, Polymer Phys Lab, Beijing 100080, Peoples R China
Recommended Citation
GB/T 7714
Hu, XZ. Wavelength sensitivity of photo-oxidation of polyamide 6[J]. POLYMER DEGRADATION AND STABILITY,1998,62(3):599-601.
APA Hu, XZ.(1998).Wavelength sensitivity of photo-oxidation of polyamide 6.POLYMER DEGRADATION AND STABILITY,62(3),599-601.
MLA Hu, XZ."Wavelength sensitivity of photo-oxidation of polyamide 6".POLYMER DEGRADATION AND STABILITY 62.3(1998):599-601.
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