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Nanosphere Lithography at the Gas/Liquid Interface: A General Approach toward Free-Standing High-Quality Nanonets
Li, Cheng; Hong, Guosong; Qi, Limin
2010-01-26
Source PublicationCHEMISTRY OF MATERIALS
ISSN0897-4756
Volume22Issue:2Pages:476-481
AbstractA general nanosphere lithography (NSL) approach toward Facile fabrication of Free-standing large-area, high-quality nanonets was developed, which was based oil a floating colloidal crystal monolayer (CCM) mask at the gas/liquid interface for materials deposition via interfacial reactions. The hole size. spacing, and thickness of the highly ordered nanonets. which showed interesting photonic properties, can he readily adjusted. This NSL approach at the gas/liquid interface can be easily extended to fabricate large-area ordered nanonets of various metal sulfides, metals as well as inorganic minerals. Furthermore, a variety of ordered gold nanoarrays with Unusual patterns were produced by using nanonet bilayers as unique deposition masks, suggesting that the obtained transferable, high-quality nanonets can function as versatile lithographic masks to generate novel nanopatterns.
DOI10.1021/cm9031946
Indexed BySCI
Language英语
WOS IDWOS:000273580700026
PublisherAMER CHEMICAL SOC
Citation statistics
Cited Times:69[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.iccas.ac.cn/handle/121111/70524
Collection中国科学院化学研究所
Corresponding AuthorQi, Limin
AffiliationPeking Univ, BNLMS, State Key Lab Struct Chem Unstable & Stable Speci, Coll Chem, Beijing 100871, Peoples R China
Recommended Citation
GB/T 7714
Li, Cheng,Hong, Guosong,Qi, Limin. Nanosphere Lithography at the Gas/Liquid Interface: A General Approach toward Free-Standing High-Quality Nanonets[J]. CHEMISTRY OF MATERIALS,2010,22(2):476-481.
APA Li, Cheng,Hong, Guosong,&Qi, Limin.(2010).Nanosphere Lithography at the Gas/Liquid Interface: A General Approach toward Free-Standing High-Quality Nanonets.CHEMISTRY OF MATERIALS,22(2),476-481.
MLA Li, Cheng,et al."Nanosphere Lithography at the Gas/Liquid Interface: A General Approach toward Free-Standing High-Quality Nanonets".CHEMISTRY OF MATERIALS 22.2(2010):476-481.
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