ICCAS OpenIR
Microphase Separation of Block Copolymer Thin Films
Zhang, Jilin1,2; Yu, Xinhong1,2; Yang, Ping1,2; Peng, Juan3; Luo, Chunxia1,2; Huang, Weihuan1,2; Han, Yanchun1,2
2010-04-06
Source PublicationMACROMOLECULAR RAPID COMMUNICATIONS
ISSN1022-1336
Volume31Issue:7Pages:591-608
AbstractToday, high-ordered micro- and nano-patterned surfaces are widely used in many areas, such as in the preparation of super-thin dielectric films, photonic crystals, antireflective films, super-non-wetting surfaces, bio-compatible surfaces and microelectric devices. Considering the critical fabrication conditions and the irreducible high cost of the photolithography technique in patterning nano-scale structures (<100 nm), the development of other micro- and nano-patterning techniques that can be used to fabricate long-range ordered features especially nanoscale arrays is a promising subject in surface science. In contrast to the traditional photolithography patterning technique, block copolymers can spontaneously phase separate into arrays of periodic patterns with length-scales of 10-50 nm, which provides an efficient pathway to pattern nanoscale features. Today, preparing long-range ordered arrays by block copolymer microphase separation is one of the most promising techniques for the fabrication of nanoscale arrays, not only being a simple process but also having a lower cost than traditional methods. In this feature article, we first summarize the many techniques developed to induce ordering in the microphase separation of the block copolymer thin films. Then, evolution, order order transitions and reversible switching microdomains are considered, since they are very important in the ordered engineering of microphase separation of the block copolymer thin films. Finally, the outlook of this research area will be given.
KeywordBlock Copolymers Lithography Microphase Separation Nanoheterogeneity
DOI10.1002/marc.200900541
Indexed BySCI
Language英语
WOS IDWOS:000276874900001
PublisherWILEY-V C H VERLAG GMBH
Citation statistics
Cited Times:28[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.iccas.ac.cn/handle/121111/69444
Collection中国科学院化学研究所
Corresponding AuthorHan, Yanchun
Affiliation1.Chinese Acad Sci, Changchun Inst Appl Chem, State Key Lab Polymer Phys & Chem, Changchun 130022, Peoples R China
2.Chinese Acad Sci, Grad Univ, Changchun 130022, Peoples R China
3.Fudan Univ, Dept Macromol Sci, Minist Educ, Key Lab Mol Engn Polymers, Shanghai 200433, Peoples R China
Recommended Citation
GB/T 7714
Zhang, Jilin,Yu, Xinhong,Yang, Ping,et al. Microphase Separation of Block Copolymer Thin Films[J]. MACROMOLECULAR RAPID COMMUNICATIONS,2010,31(7):591-608.
APA Zhang, Jilin.,Yu, Xinhong.,Yang, Ping.,Peng, Juan.,Luo, Chunxia.,...&Han, Yanchun.(2010).Microphase Separation of Block Copolymer Thin Films.MACROMOLECULAR RAPID COMMUNICATIONS,31(7),591-608.
MLA Zhang, Jilin,et al."Microphase Separation of Block Copolymer Thin Films".MACROMOLECULAR RAPID COMMUNICATIONS 31.7(2010):591-608.
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