ICCAS OpenIR
Ta-doped In2O3 transparent conductive films with high transmittance and low resistance
Wang, Biao1; Hu, LiMing1; Liu, FengMin2; Qin, Li1; Liu, Yun1; Wang, LiJun1
2010
Source PublicationOPTICA APPLICATA
ISSN0078-5466
Volume40Issue:1Pages:25-31
AbstractTa-doped In2O3 transparent conductive oxide (TCO) thin films are deposited on glass substrates by radio-frequency (RF) sputtering at room-temperature. The influence of sputtering power on the structural, morphologic, electrical, and optical properties of the films is investigated by X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), Hall measurement, and optical transmission spectroscopy. The obtained films are polycrystalline with a cubic structure and preferentially oriented in the (222) crystallographic direction. The minimum resistivity of 2.8x10(-4) Omega cm is obtained from the film deposited at the sputtering power of 170 W. The average optical transmittance of the films is over 90%.
KeywordSputtering In2o3 Transparent Conductive Oxide Thin Films
Indexed BySCI
Language英语
WOS IDWOS:000277647100003
PublisherTECHNICAL UNIV WROCLAW
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Document Type期刊论文
Identifierhttp://ir.iccas.ac.cn/handle/121111/68990
Collection中国科学院化学研究所
Corresponding AuthorWang, Biao
Affiliation1.Chinese Acad Sci, Key Lab Excited State Proc, Changchun Inst Opt Fine Mech & Phys, Changchun 130033, Peoples R China
2.Chinese Acad Sci, State Key Lab Polymer Phys & Chem, Changchun Inst Appl Chem, Changchun 130022, Peoples R China
Recommended Citation
GB/T 7714
Wang, Biao,Hu, LiMing,Liu, FengMin,et al. Ta-doped In2O3 transparent conductive films with high transmittance and low resistance[J]. OPTICA APPLICATA,2010,40(1):25-31.
APA Wang, Biao,Hu, LiMing,Liu, FengMin,Qin, Li,Liu, Yun,&Wang, LiJun.(2010).Ta-doped In2O3 transparent conductive films with high transmittance and low resistance.OPTICA APPLICATA,40(1),25-31.
MLA Wang, Biao,et al."Ta-doped In2O3 transparent conductive films with high transmittance and low resistance".OPTICA APPLICATA 40.1(2010):25-31.
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