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Electrochemistry of Sc3N@C-78 embedded in didodecyldimethylammonium bromide films in aqueous solution
Zhao, Mingyan1; Zhang, Lin1; Chen, Ning2; Wang, Chunru2; Fan, Louzhen1; Yang, Shihe3
2009-04-01
Source PublicationMICROCHIMICA ACTA
ISSN0026-3672
Volume165Issue:1-2Pages:45-52
AbstractThe electrochemical behavior of trimetallic nitride clusterfullerene (Sc3N@C-78) embedded in films of the cationic surfactant didodecyldimethylammonium bromide (DDAB) on glassy carbon (GC) electrodes in aqueous solution was investigated. Four pairs of reversible redox peaks were observed in the potential range between +0.6 and -0.9 V vs. SCE. Different to the electrochemistry of pristine Sc3N@C-78 in organic solution, the first reduction is a one-electron rather than simultaneous two-electron process because of the strong binding between DDA(+) and the monoanion of Sc3N@C-78. The generated radial monoanion, dianion and trianion of Sc3N@C-78 are stable during continuous potential cycling, while some chemical reactions take place when the third anion is further reduced in the films. The cyclic voltammograms of Sc3N@C-78/DDAB films checked at different temperatures pointed to strong temperature dependence. The electrochemical processes were also measured in different electrolytes, which showed pronounced anionic dependence and no cathodic dependence on either the cation or anions present. A possible electron-transfer mechanism of a Sc3N@C-78/DDAB film was presented.
KeywordSc3n@c-78 Ddab Films Electrochemistry
DOI10.1007/s00604-008-0095-1
Indexed BySCI
Language英语
WOS IDWOS:000264487000006
PublisherSPRINGER WIEN
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Document Type期刊论文
Identifierhttp://ir.iccas.ac.cn/handle/121111/67026
Collection中国科学院化学研究所
Corresponding AuthorFan, Louzhen
Affiliation1.Beijing Normal Univ, Dept Chem, Beijing 100875, Peoples R China
2.Chinese Acad Sci, Inst Chem, Beijing 100080, Peoples R China
3.Hong Kong Univ Sci & Technol, Dept Chem, Kowloon, Hong Kong, Peoples R China
Recommended Citation
GB/T 7714
Zhao, Mingyan,Zhang, Lin,Chen, Ning,et al. Electrochemistry of Sc3N@C-78 embedded in didodecyldimethylammonium bromide films in aqueous solution[J]. MICROCHIMICA ACTA,2009,165(1-2):45-52.
APA Zhao, Mingyan,Zhang, Lin,Chen, Ning,Wang, Chunru,Fan, Louzhen,&Yang, Shihe.(2009).Electrochemistry of Sc3N@C-78 embedded in didodecyldimethylammonium bromide films in aqueous solution.MICROCHIMICA ACTA,165(1-2),45-52.
MLA Zhao, Mingyan,et al."Electrochemistry of Sc3N@C-78 embedded in didodecyldimethylammonium bromide films in aqueous solution".MICROCHIMICA ACTA 165.1-2(2009):45-52.
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