ICCAS OpenIR
In Situ Epitaxial Growth of Triangular CdS Nanoplates on Mica by Dip-Pen Nanolithography
Chu, Haibin1; Ding, Lei1; Wang, Jinyong1; Li, Xuemei1; You, Liping2; Li, Yan1
2008-12-04
Source PublicationJOURNAL OF PHYSICAL CHEMISTRY C
ISSN1932-7447
Volume112Issue:48Pages:18938-18942
AbstractEpitaxial growth of triangular US nanoplates by dip-pen nanolithography is achieved on a mica substrate. This method offers in situ initiating, controlling, and monitoring of the epitaxial growth of triangular CdS plates in nanoscale. Control experiments and structure analysis indicate that both the tip-modulated crystallization and matching in the crystal structures (symmetry and lattice) of US and mica play key roles in the epitaxial growth of well-crystallized US nanostructures.
DOI10.1021/jp807746g
Indexed BySCI
Language英语
WOS IDWOS:000261218400036
PublisherAMER CHEMICAL SOC
Citation statistics
Cited Times:9[WOS]   [WOS Record]     [Related Records in WOS]
Document Type期刊论文
Identifierhttp://ir.iccas.ac.cn/handle/121111/63922
Collection中国科学院化学研究所
Corresponding AuthorLi, Yan
Affiliation1.Coll Chem & Mol Engn, Natl Lab Rare Earth Mat Chem & Applicat, Key Lab Phys & Chem Nanodevices, Beijing Natl Lab Mol Sci, Beijing 100871, Peoples R China
2.Peking Univ, Electron Microscopy Lab, Beijing 100871, Peoples R China
Recommended Citation
GB/T 7714
Chu, Haibin,Ding, Lei,Wang, Jinyong,et al. In Situ Epitaxial Growth of Triangular CdS Nanoplates on Mica by Dip-Pen Nanolithography[J]. JOURNAL OF PHYSICAL CHEMISTRY C,2008,112(48):18938-18942.
APA Chu, Haibin,Ding, Lei,Wang, Jinyong,Li, Xuemei,You, Liping,&Li, Yan.(2008).In Situ Epitaxial Growth of Triangular CdS Nanoplates on Mica by Dip-Pen Nanolithography.JOURNAL OF PHYSICAL CHEMISTRY C,112(48),18938-18942.
MLA Chu, Haibin,et al."In Situ Epitaxial Growth of Triangular CdS Nanoplates on Mica by Dip-Pen Nanolithography".JOURNAL OF PHYSICAL CHEMISTRY C 112.48(2008):18938-18942.
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