ICCAS OpenIR
Formation of ordered microphase-separated pattern during spin coating of ABC triblock copolymer
Huang, Weihuan; Luo, Chunxia; Zhang, Jilin; Han, Yanchun
2007-03-14
Source PublicationJOURNAL OF CHEMICAL PHYSICS
ISSN0021-9606
Volume126Issue:10
AbstractIn this paper, the authors have systematically studied the microphase separation and crystallization during spin coating of an ABC triblock copolymer, polystyrene-b-poly(2-vinylpyridine)-b-poly(ethylene oxide) (PS-b-P2VP-b-PEO). The microphase separation of PS-b-P2VP-b-PEO and the crystallization of PEO blocks can be modulated by the types of the solvent and the substrate, the spinning speed, and the copolymer concentration. Ordered microphase-separated pattern, where PEO and P2VP blocks adsorbed to the substrate and PS blocks protrusions formed hexagonal dots above the P2VP domains, can only be obtained when PS-b-P2VP-b-PEO is dissolved in N,N-dimethylformamide and the films are spin coated onto the polar substrate, silicon wafers or mica. The mechanism of the formation of regular pattern by microphase separation is found to be mainly related to the inducement of the substrate (middle block P2VP wetting the polar substrate), the quick vanishment of the solvent during the early stage of the spin coating, and the slow evaporation of the remaining solvent during the subsequent stage. On the other hand, the probability of the crystallization of PEO blocks during spin coating decreases with the reduced film thickness. When the film thickness reaches a certain value (3.0 nm), the extensive crystallization of PEO is effectively prohibited and ordered microphase-separated pattern over large areas can be routinely prepared. When the film thickness exceeds another definite value (12.0 nm), the crystallization of PEO dominates the surface morphology. For films with thickness between these two values, microphase separation and crystallization can simultaneously occur. (c) 2007 American Institute of Physics.
DOI10.1063/1.2710277
Indexed BySCI
Language英语
WOS IDWOS:000244895600029
PublisherAMER INST PHYSICS
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Document Type期刊论文
Identifierhttp://ir.iccas.ac.cn/handle/121111/62858
Collection中国科学院化学研究所
Corresponding AuthorHuang, Weihuan
Affiliation1.Chinese Acad Sci, Changchun Inst Appl Chem, State Key Lab Polymer Phys & Chem, Changchun 130022, Peoples R China
2.Grad Univ Chinese Acad Sci, Changchun 130022, Peoples R China
Recommended Citation
GB/T 7714
Huang, Weihuan,Luo, Chunxia,Zhang, Jilin,et al. Formation of ordered microphase-separated pattern during spin coating of ABC triblock copolymer[J]. JOURNAL OF CHEMICAL PHYSICS,2007,126(10).
APA Huang, Weihuan,Luo, Chunxia,Zhang, Jilin,&Han, Yanchun.(2007).Formation of ordered microphase-separated pattern during spin coating of ABC triblock copolymer.JOURNAL OF CHEMICAL PHYSICS,126(10).
MLA Huang, Weihuan,et al."Formation of ordered microphase-separated pattern during spin coating of ABC triblock copolymer".JOURNAL OF CHEMICAL PHYSICS 126.10(2007).
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