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题名: The steady flying of a plasmonic flying head over a photoresist-coated surface in a near-field photolithography system
作者: Ji, Jiaxin1; Hu, Yueqiang1; Meng, Yonggang1; Zhang, Jun1; Xu, Jian2; Li, Shayu2; Yang, Guoqiang2
关键词: NFPT ; plasmonic lens ; molecular glass photoresist ; molecular gas lubrication
刊名: NANOTECHNOLOGY
发表日期: 2016-05-06
卷: 27, 期:18
收录类别: SCI
英文摘要: The near-field photolithography technique (NFPT) offers a new approach of nanolithography for a dramatic increase in the resolution with high throughput and low cost. The NFPT utilizes the same flight principle as that of the magnetic head of hard-disk drives but replacing the magnetic head with a plasmonic flying head. The plasmonic flying head, which can focus the incident laser beam to a spot size of sub-20 nm with an enhanced field intensity by exciting surface plasmon polaritons, takes off and then flies steadily above the revolving disk coated by a photoresist film to be patterned with a narrow gap of tens of nanometers. As a key foundation of the NFPT, the take off and flight stability of the plasmonic flying head affects the pattern density and the fabrication efficiency. This work proposed and investigated a molecular glass photoresist, named FPT-8Boc, for the large-scale consistent fabrication with the NFPT. To overcome the take-off problem of the head over the soft photoresist film, a transition zone is intentionally formed by washing off the coated photoresist in the outer area of the disk using a solvent. The simulation results by COMSOL Multiphysics software and quasi-Newton iteration method review that the matched transition zone height with spreading length can guarantee the flight stability of the plasmonic flying head on the soft photoresist. Using this method, a preliminary photolithography result with a 31 nm line width has been achieved.
语种: 英语
内容类型: 期刊论文
URI标识: http://ir.iccas.ac.cn/handle/121111/35957
Appears in Collections:光化学实验室_期刊论文

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作者单位: 1.Tsinghua Univ, State Key Lab Tribol, Beijing 100084, Peoples R China
2.Chinese Acad Sci, Inst Chem, CAS Key Lab Photochem, Beijing Natl Lab Mol Sci, Beijing 100190, Peoples R China
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